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Dr. Jang is an assistant professor in the Department of Mechanical Engineering at the ÌìÃÀ´«Ã½°²×¿Æƽâ°æ. Dr. Jang received her PhD in Materials Science and Engineering at North Carolina State University. During her graduate study, she worked on the microstructure and mechanical properties of nanocrystalline metals and alloys. After her PhD, she worked as a principal research engineer and project leader of printed electronics research group in Samsung Electro-Mechanics (2007-2015) and as a research associate in Sungkyunkwan University (2015-2017). Her research focuses on semiconductor processing, thin film growth, nanomaterials synthesis and process, materials characterization, and flexible/printed electronics.

Ph.D. in Materials Science and Engineering
North Carolina State University

M.B.A. 
College of Business, Korea Advanced Institute of Science and Technology, Korea

M.S. in Physics
Sungkyunkwan University, Korea

B.S. in Physics
Sungkyunkwan University, Korea

• Growth and characterization of functional thin films using plasma enhanced chemical vapor deposition of organic/inorganic precursors: ceramic thin films for passivation or encapsulation layers in organic electronics, low-k dielectric films for flexible electronics, hard mask layers used for ultra-fine patterned semiconductor devices, and chemically modified polymerized thin films for biocompatibility applied to biochips/biosensors
• Development of printing technologies with various printing methods (inkjet/screen/gravure) and sintering processes (thermal/photonic/laser/microwave/plasma) for electrodes and interconnects used in flexible electronic devices including thin film transistors, flex circuits, RFIDs, sensors, solar cells, light emitting diodes, printed circuit boards, and integrated circuit packaging

• R. Chowdhury, T. Poche, and S. Jang*, Study on structural and electrical properties of flexible low dielectric constant materials, J. Mater. Sci. 10.1007/s10853-026-12559-5
• T. Poche, R. Chowdhury, and S. Jang*, Effects of ultraviolet irradiation on polymer-like hydrogenated amorphous carbon thin films, Thin Solid Films, under revision
• R. Chowdhury, T. Poche, and S. Jang*, Effects of metal diffusion on electrical performance and reliability of low dielectric constant materials under thermal stress, Mater. Sci. Semicond. Proc. 207, 110477 (2026). https://doi.org/10.1016/j.mssp.2026.110477
• C. Seo, J. Choi, K. Bae, J. Kim, N. Baek, S. Jang*, and D. Jung*, Introducing tris(trimethylsiloxy)silane as a new precursor for low-k thin films in plasma-enhanced chemical vapor deposition system, J. Mater. Res. 40, 1088-1097 (2025). https://doi.org/10.1557/s43578-025-01558-y
• C. Seo, N. Baek, Y. Park, H. Lim, S. Lee, J. Yang, S. Jang*, and D. Jung*, Effects of diethoxymethylsilane/helium flow rate ratio on low-k films deposited by plasma-enhanced chemical vapor deposition, ECS J. Solid State. Sci. Technol. 13, 093008 (2024). https://doi.org/10.1149/2162-8777/ad7900